Ahmed Busnaina Gives Keynote at China Symposium

| December 7, 2015

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Earlier this fall, Dr. Ahmed Busnaina, director of the NSF Center for High-Rate Nanomanufacturing at Northeastern University, was the invited keynote speaker at the 5th Chinese Flexible and Printed Electronics (FPE) Symposium, held in in Suzhou, China. Busnaina’s presentation focused on technology innovations coming out of Massachusetts, such as the Nanoscale Offset Printing System (NanoOPS). Based on patented technologies developed at Northeastern, NanoOPS has the capability of printing features down two 30 nanometers over large areas.

The FPE Symposium’s Global Partners included the the organizers of major events for the FPE sector in Japan, Korea, Iran, and India, as well as the TechConnect World Expo, held every summer outside of Washington, DC. In the technology expo that was associated with the symposium, about 100 businesses displayed technologies relating to flexible and printed electronics. Participants were particularly keen on learning how the expertise at the Center for High-rate Nanomanufacturing can help advance the FPE sector.